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TRANSIENT ANNEALING OF ION IMPLANTED GAASSEALY BJ.1982; MICROELECTRONICS; ISSN 0026-2692; GBR; DA. 1982; VOL. 13; NO 1; PP. 21-28; BIBL. 28 REF.Article

EFFECTS OF LASER IRRADIATION OF GAAS OBSERVED BY D.L.T.S.EMERSON NG; SEALY BJ.1979; ELECTRON. LETTERS; GBR; DA. 1979; VOL. 15; NO 18; PP. 553-554; BIBL. 5 REF.Article

A COMPARISON OF SN-, GE-, SE- AND TE-ION-IMPLANTED GAAS.SURRIDGE RK; SEALY BJ.1977; J. PHYS. D; G.B.; DA. 1977; VOL. 10; NO 6; PP. 911-917; BIBL. 7 REF.Article

ENCAPSULATION OF ION-IMPLANTED GAAS USING NATIVE OXIDES.SEALY BJ; D'CRUZ ADE.1975; ELECTRON. LETTERS; G.B.; DA. 1975; VOL. 11; NO 15; PP. 323-324; BIBL. 12 REF.Article

SOME PHYSICAL PROPERTIES OF THE PBTE-MGTE ALLOY SYSTEMCROCKER AJ; SEALY BJ.1972; J. PHYS. CHEM. SOLIDS; G.B.; DA. 1972; VOL. 33; NO 12; PP. 2183-2190; BIBL. 23 REF.Serial Issue

LASER ANNEALING OF LOW DOSE SE-IMPLANTED GAAS STUDIED BY D.L.T.S.EMERSON NG; SEALY BJ.1980; ELECTRON. LETTERS; GBR; DA. 1980; VOL. 16; NO 13; PP. 512-514; BIBL. 5 REF.Article

LASER ANNEALING OF ZINC IMPLANTED GAASKULAR SS; SEALY BJ.1980; SOLID-STATE ELECTRON.; GBR; DA. 1980; VOL. 23; NO 8; PP. 875-880; BIBL. 6 REF.Article

STUDIES OF THERMALLY-OXIDIZED GAAS BY TRANSMISSION ELECTRON MICROSCOPY.BULL CJ; SEALY BJ.1978; PHILOS. MAG., A; GBR; DA. 1978; VOL. 37; NO 4; PP. 489-500; BIBL. 14 REF.Article

ELECTRON MICROSCOPY OF EPITAXIAL PBTE FILMS.SEALY BJ; CROCKER AJ.1975; THIN SOLID FILMS; NETHERL.; DA. 1975; VOL. 26; NO 1; PP. 135-146; BIBL. 25 REF.Article

CHANGES IN THE THERMAL OXIDATION OF GALLIUM ARSENIDE INDUCED BY ION IMPLANTATIONBUTCHER DN; SEALY BJ.1979; ELECTRON. LETTERS; GBR; DA. 1979; VOL. 15; NO 2; PP. 51-52; BIBL. 9 REF.Article

ELECTRICAL PROPERTIES OF THERMAL OXIDES ON GAAS.BUTCHER DN; SEALY BJ.1977; ELECTRON. LETTERS; G.B.; DA. 1977; VOL. 13; NO 19; PP. 558-559; BIBL. 10 REF.Article

SURFACE ACCUMULATION OF ION-IMPLANTED TIN IN GAAS AFTER LASER ANNEALINGBADAWI MH; SEALY BJ; STEPHENS KG et al.1982; J. PHYS. D; ISSN 0022-3727; GBR; DA. 1982; VOL. 15; NO 3; PP. 507-513; BIBL. 5 REF.Article

RUTHERFORD BACK-SCATTERING AND ELLIPSOMETRY OF SELENIUM IMPLANTED INPGILL SS; SEALY BJ; STEPHENS KG et al.1981; J. PHYS. D; ISSN 0022-3727; GBR; DA. 1981; VOL. 14; NO 10; PP. 1915-1922; BIBL. 17 REF.Article

REDISTRIBUTION OF CHROMIUM IN SEMI-INSULATING GAASCR DURING LASER ANNEALINGBADAWI MH; SEALY BJ; CLEGG JB et al.1980; ELECTRON. LETTERS; GBR; DA. 1980; VOL. 16; NO 14; PP. 554-556; BIBL. 12 REF.Article

ELECTRICAL PROFILES FROM ZINC IMPLANTED GAAS.KULAR SS; SEALY BJ; STEPHENS KG et al.1978; ELECTRON. LETTERS; G.B.; DA. 1978; VOL. 14; NO 1; PP. 2-4; BIBL. 6 REF.Article

SOME PROPERTIES OF ANNEALED SI3N4 LAYERS ON GAASBELL EC; SEALY BJ; SURRIDGE RK et al.1978; THIN SOLID FILMS; NLD; DA. 1978; VOL. 51; NO 1; PP. 77-82; BIBL. 16 REF.Article

CARRIER REMOVAL AFTER H1+, H2+ OR H3+ IMPLANTS INTO GAAS.GECIM HC; SEALY BJ; STEPHENS KG et al.1976; ELECTRON. LETTERS; G.B.; DA. 1976; VOL. 12; NO 25; PP. 668-669Article

VAPORISATION OF GAAS DURING LASER ANNEALINGBADAWI MH; SEALY BJ; STEPHENS KG et al.1979; ELECTRON. LETTERS; GBR; DA. 1979; VOL. 15; NO 24; PP. 786-787; BIBL. 7 REF.Article

ELECTRICAL PROPERTIES OF LASER ANNEALED DONOR-IMPLANTED GAASSEALY BJ; KULAR SS; STEPHENS KG et al.1978; ELECTRON. LETTERS; GBR; DA. 1978; VOL. 14; NO 22; PP. 720-721; BIBL. 5 REF.Article

EFFECTS OF CHANNELLING ON THE ELECTRICAL PROPERTIES OF DONOR IMPLANTED GAAS.HARRIS TJ; SEALY BJ; SURRIDGE RK et al.1976; ELECTRON. LETTERS; G.B.; DA. 1976; VOL. 12; NO 25; PP. 664-665; BIBL. 4 REF.Article

PULSED LASER ANNEALING OF SELENIUM IMPLANTED INPGILL SS; TOPHAM PJ; SEALY BJ et al.1981; J. PHYS. D; ISSN 0022-3727; GBR; DA. 1981; VOL. 14; NO 12; PP. 2333-2339; H.T. 1; BIBL. 7 REF.Article

ELECTRICAL, RUTHERFORD BACKSCATTERING AND TRANSMISSION ELECTRON MICROSCOPY STUDIES OF FURNACE ANNEALED ZINC IMPLANTED GAASKULAR SS; SEALY BJ; STEPHENS KG et al.1980; SOLID-STATE ELECTRON.; GBR; DA. 1980; VOL. 23; NO 8; PP. 831-838; BIBL. 16 REF.Article

MULTIPLY SCANNED ELECTRON BEAM ANNEALING OF DUAL IMPLANTS IN GAASSHAHID MA; MOFFATT S; BARRETT NJ et al.1983; RADIATION EFFECTS; ISSN 0033-7579; GBR; DA. 1983; VOL. 70; NO 1-4; PP. 291-299; BIBL. 12 REF.Article

EFFECT OF SI3N4 ENCAPSULATION ON THE LASER-ANNEALING BEHAVIOUR OF GAASBADAWI MH; AKINTUNDE JA; SEALY BJ et al.1979; ELECTRON. LETTERS; GBR; DA. 1979; VOL. 15; NO 15; PP. 447-448; BIBL. 5 REF.Article

LASER ANNEALING OF CAPPED AND UNCAPPED GAASKULAR SS; SEALY BJ; BADAWI MH et al.1979; ELECTRON. LETTERS; GBR; DA. 1979; VOL. 15; NO 14; PP. 413-414; BIBL. 5 REF.Article

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